TY  - THES
DP  - http://www.theses.fr/2018GREAT114
TI  - Impact of 14/28nm FDSOI high-k metal gate stack processes on reliability and electrostatic control through combined electrical and physicochemical characterization techniques
AU  - Kumar, Pushpendra
A3  - Ghibaudo, Gérard; Leroux, Charles
PY  - 2018
N1  - Thèse de doctorat Nano electronique et nano technologies Université Grenoble Alpes (ComUE) 2018
N1  - 2018GREAT114
UR  - http://www.theses.fr/2018GREAT114/document
ER  -