Etude de l'intérêt des plasmas synchronisés pulsés pour la fabrication des nanostructures

par Mélisa Brihoum

Projet de thèse en Nano electronique et nano technologies

Sous la direction de Gilles Cunge et de Olivier Joubert.

Thèses en préparation à Grenoble Alpes , dans le cadre de Electronique, Electrotechnique, Automatique, Traitement du Signal (EEATS) , en partenariat avec LTM - Laboratoire des Technologies Microélectroniques (laboratoire) depuis le 01-10-2010 .

  • Résumé

    During this PhD, a new way to use plasmas sources (pulsed plasma) will be explored to tend to address these problems and to develop etching process adapted to integrated circuits new generations. These work are based on use of an industrial ICP reactor designed to etch 300 nm wafers but modified to host plasma and surface diagnostics. this equipment, unique in the world, is located in CEA-LETI clean rooms in partnership with the American equipment manufacturer Applied Materials. Etching process development using pulsed plasmas will exploit fine analysis of pulse modulation impact both of these physicochemical characteristics (use of time resolved plasma diagnostics) and on precise etched surfaces analysis (XPS, ellipsometry, ...). The more advanced lithography technologies (e-beam, 193 nm immersion lithography) are also available in the labor and will be used to develop pulsed plasma etching process with nanometrics structures.

  • Titre traduit

    Analysis of synchronized pulsed plasma for the manufacture of nanostructures

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