2D & 3D structuration of solution-based metal oxide precursor via photolithography and its optical/electrical application

par Shang-Yu Yu

Thèse de doctorat en Chimie physique

Sous la direction de Olivier Soppera, Arnaud Spangenberg et de Hsiao Wen Zan.

Thèses en préparation à Mulhouse en cotutelle avec National Chiao Tung University, Department of Photonics (Hsinchu, Taiwan) , dans le cadre de École doctorale Physique et chimie-physique (Strasbourg ; 1994-....) depuis le 29-01-2016 .

  • Résumé

    In this thesis, an in-depth study of the 2D patterning and 3D structuration of metal oxide via photolithography was made. The interests of different photolithography processes were shown by investigating its corresponding applications. Starting form one-photon lithography technique for 2D patterning of metal oxide material, the patterning technique was divided by indirect and direct method. By using self-assembled monolayers (SAM) with DUV patterning, the proposed surface dewetting technique shows the potential for patterning of different metal oxide precursor. In the other hand, DUV light was used to directly pattern photosensitive metal oxide. The effect of DUV patterning on metal oxide film was investigated in macroscale and in nanoscale. The photo-patterned metal oxide film was used as active layer for transistor application to investigate the influence of DUV on the performance of transistor. To further structure the metal oxide material in 3D configuration, the TiMAA and ZnMAA resists compatible for two photon structuration was developed. The photo-induced chemical reaction was firstly investigated in 2D configuration. By adjusting with different conditions, the structures with controllable conductivity and those with nanoscale periodic fringes were shown to be able to apply in pressure sensor application and photonic crystal application, respectively. Finally, with the preparation of droplet shape photoresist, the 3D structuration of metal oxide precursor was realized. With a thermal annealing process, the ZnO based s3D tructure was used for micro-optics and UV photodetector application. The research work realized by this thesis not only open a new concept in the chemistry of the photo-induced thermal reaction mechanism, but also a new possibility for 3D structuration of semiconducting material. Owing to the excellent properties of metal oxide based material, various type of applications can be imagined based on this breakthrough in the direct writing of the metal oxide material.