Integration d'oxydes fonctionnels pour des applications en photonique

par Guillaume Marcaud

Projet de thèse en Electronique et Optoélectronique, Nano- et Microtechnologies

Sous la direction de Laurent Vivien et de Sylvia Matzen.

Thèses en préparation à Paris Saclay , dans le cadre de Electrical,Optical,Bio: PHYSICS_AND_ENGINEERING , en partenariat avec Centre de Nanosciences et de Nanotechnologies (laboratoire) , Photonique (equipe de recherche) et de Université Paris-Sud (établissement de préparation de la thèse) depuis le 01-10-2015 .

  • Résumé

    L'objectif de la thèse est de développer l'intégration d'oxydes fonctionnels en photonique par leur croissance épitaxiale sur silicium et saphir. Le contrôle de la qualité de l'oxyde et des contraintes sur silicium vont être étudiés.

  • Titre traduit

    Integration of functional oxides for photonic applications

  • Résumé

    Intensive research is currently focused on the miniaturization process of devices, combining photonics and electronics, in order to decrease power consumption and create novel functionalities. In this context, the development of hybrid materials based on oxides (offering interesting optical, piezoelectric and photovoltaic properties) integrated on silicon is a clear scientific and technological challenge. The aim of this thesis is to develop innovative photonic and electronic micro-devices by integrating complex epitaxial oxide thin films in heterostructures on silicon and sapphire and by optimizing their physical properties. This work will be mainly focused on the optimization of the materials (crystalline quality, control of strain fields and interfaces in heterostructures), on the fundamental study of different physical mechanisms at the nanoscale, and on the design of novel photonic devices. This project has two main objectives: inducing giant nonlinear optical properties by strain engineering in silicon to develop innovative photonic devices, and developing an optical tunable photonic system. The experimental work will include the growth of oxide layers on silicon and sapphire substrates by pulsed laser deposition, their micro-structuration in clean room (lithography, etching) and their charaterization by several complementary techniques, such as X ray diffraction, AFM-SEM microscopies, Raman spectroscopy, various electrical (dielectric, piezoelectric, photovoltaic) and optical measurements. The PhD student will benefit from the complementary expertise of two teams at C2N, on functional oxide thin films and on silicon photonic devices. He will have access to many characterization techniques, available at C2N and its cleanroom facility, and through several established collaborations. At the end of the thesis, the candidate will have a large and interdisciplinary expertise in the growth and structuration of materials, in microelectronics and photonics, that will be beneficial for his future career. During the thesis, the presentation of the work at international conferences will be strongly promoted, as well as the publication of articles and the participation in collaborations.