TY  - THES
DP  - http://www.theses.fr/2016GREAT009
TI  - Development and characterization of plasma etching processes for the dimensional control and LWR issues during High-k Metal gate stack patterning for 14FDSOI technologies
AU  - Ros Bengoetxea, Onintza
A3  - Pargon, Erwine; Gouraud, Pascal
PY  - 2016
N1  - Thèse de doctorat Nanoélectronique et nanotechnologie Université Grenoble Alpes (ComUE) 2016
N1  - 2016GREAT009
UR  - http://www.theses.fr/2016GREAT009/document
ER  -