Thèse de doctorat en Sciences de l'ingénieur. Génie des procédés
Sous la direction de Khaled Hassouni.
Soutenue en 2005
à Paris 13 en cotutelle avec l'Università degli studi (Bari, Italie). Dipartimento di chimica .
Pas de résumé disponible.
Carbon films deposited by Argon/Methane CVD plasmas : study of the process and material characterization
Raman spectroscopy [1,2] is a standard nondestructive technique for the characterization of crystalline, nanocrystalline and amorphous carbons and it's generally used to derive the structural information of carbon materials. Raman scattering is an interacton between a photon (generally in the visible range) and the electronic cloud of the molecules or the crystal. He difference in energy between the incoming and the outgoing photons corresponds to an energy of vibrations (phonon for a crystal) of the studied materials. In other words, when a substance is passed through a monochromatic electromagnetic wave, four phenomena generally occur : the reflection, transmision, the absorption and diffusion of the radiation considered. The diffused intensity, dependent on the dispersion of incident energy in all the directions, is generally rather low, about 10̄̄̄̄̄̄. . . . To 10. . . . Times the incident intensity. The major part of the diffused intensity is due to the elastic scattering of the photons on the molecules i. E. Without change of requency and is called diffusion Rayleigh (1871). . . .